If you would like additional information, please contact:

Goddard Space Flight Center
Innovative Partnerships Program Office
Code 504
phone: (301) 286-5810
email: Innovative Partnerships Program Office

Plasma Etching

		MENU + Ion Implantation + Thin Implantation – Plasma Etching + Wet Chemistry + Annealing + Photolithography + Safety CONTACTS
Plasma etching equipment provides dry etching alternatives as well as anisotropic removal of thin-film materials. Both electron cyclotron resonance (ECR) and reactive ion etching (RIE) systems are available for etching materials such as silicon dioxide and silicon nitride.